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Primary ion implantation and recoil implantation effects in Cs depth profiling of thin metallic layers on LiNbO3

✍ Scribed by M. V. Ciampolillo; C. Sada

Book ID
112206872
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
120 KB
Volume
45
Category
Article
ISSN
0142-2421

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Implantations of Xe +, Ar + and N + ions at room temperature cause radiation damage, volume expansion and near-surface decomposition in LiNbO 3. Precipitates of Li20 are formed in surface regions when exposed to the atmosphere. Amorphization induced by heavy damage is observed in the ionimplanted re