Preparation of YBaCuO thin films with excellent crystallinity on amorphous substrates prepared by facing targets sputtering
โ Scribed by Nakagawa, S.; Takeuchi, T.; Naoe, M.
- Book ID
- 114546496
- Publisher
- IEEE
- Year
- 1990
- Tongue
- English
- Weight
- 260 KB
- Volume
- 26
- Category
- Article
- ISSN
- 0018-9464
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The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a
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