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Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma

โœ Scribed by Chisato Niikura; Michio Kondo; Akihisa Matsuda


Book ID
116667664
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
369 KB
Volume
338-340
Category
Article
ISSN
0022-3093

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