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Influence of substrate dc bias on crystallinity of silicon films grown at a high rate from inductively-coupled plasma CVD

✍ Scribed by N. Kosku; H. Murakami; S. Higashi; S. Miyazaki


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
210 KB
Volume
244
Category
Article
ISSN
0169-4332

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