✦ LIBER ✦
Development of microcrystalline silicon thin films with high deposition rate (over 10 nm/s) using VHF hollow electrode enhanced glow plasma
✍ Scribed by M. Takashiri; T. Tabuchi
- Book ID
- 104094791
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 426 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0257-8972
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