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Precursors and operating conditions for the metal-organic chemical vapor deposition of nickel films

✍ Scribed by Laurent Brissonneau; Constantin Vahlas

Book ID: 114124525
Publisher: Editions Lavoisier
Year: 2000
Tongue: English
Weight: 801 KB
Volume: 25
Category: Article
ISSN: 0151-9107
DOI: 10.1016/s0151-9107(00)88716-4

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