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Metal Organic Chemical Vapor Deposition of nickel oxide thin films for wide band gap device technology

โœ Scribed by Lo Nigro, Raffaella; Battiato, Sergio; Greco, Giuseppe; Fiorenza, Patrick; Roccaforte, Fabrizio; Malandrino, Graziella

Book ID
121823176
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
911 KB
Volume
563
Category
Article
ISSN
0040-6090

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Precursors and operating conditions for
Precursors and operating conditions for the metal-organic chemical vapor deposition of nickel films
โœ Laurent Brissonneau; Constantin Vahlas ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Editions Lavoisier ๐ŸŒ English โš– 801 KB

The different precursors that have been tested or that are actually in use for the processing of thin films of nickel by the chemical vapor deposition technique are reviewed. Applications of thin films of nickel are presented. Deposition conditions and characteristics of the films obtained from diff