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Post-annealing temperature dependence of blistering in high-fluence ion-implanted H in Si 〈1 0 0〉

✍ Scribed by J.H. Liang; C.Y. Bai; D.S. Chao; C.M. Lin

Book ID
108224143
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
381 KB
Volume
266
Category
Article
ISSN
0168-583X

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