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Porous n-silicon produced by photoelectrochemical etching

✍ Scribed by C. Lévy-Clément; A. Lagoubi; D. Ballutaud; F. Ozanam; J.-N. Chazalviel; M. Neumann-Spallart

Book ID
103617038
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
748 KB
Volume
65-66
Category
Article
ISSN
0169-4332

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Submicrometer period silicon diffraction
Submicrometer period silicon diffraction gratings by porous etching
✍ Nagy, N. ;Volk, J. ;Hámori, A. ;Bársony, I. 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 210 KB

## Abstract We have developed a new technique to manufacture diffraction gratings on porous silicon and on silicon interface. Using holography facilitate to adjust the periodic length of gratings in the submicron range. The holographically exposured and developed photoresist applied on the silicon