𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Submicrometer period silicon diffraction gratings by porous etching

✍ Scribed by Nagy, N. ;Volk, J. ;Hámori, A. ;Bársony, I.

Book ID
105363171
Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
210 KB
Volume
202
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.

✦ Synopsis

Abstract

We have developed a new technique to manufacture diffraction gratings on porous silicon and on silicon interface. Using holography facilitate to adjust the periodic length of gratings in the submicron range. The holographically exposured and developed photoresist applied on the silicon surface provides the mask for the ion implantation. The sinusoidal grating between the substrate and the porous silicon layer is achieved after the anodic etch process. The PS layer can be removed by alkali etching. Sinusoidal one‐ and two‐dimensional diffraction gratings have been produced with 375 nm periodic length. Their AFM images are shown. The diffraction efficiencies were measured. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

📜 SIMILAR VOLUMES

Diffraction gratings on porous silicon
Diffraction gratings on porous silicon
✍ A.V Alexeev-Popov; S.A Gevelyuk; Ya.O Roizin; D.P Savin; S.A Kuchinsky 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 264 KB
Laterally stacked porous silicon multila
Laterally stacked porous silicon multilayers for subquart micron period UV gratings
✍ Volk, J. ;Norbert, N. ;Bársony, I. 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 219 KB

## Abstract A novel method was presented to prepare porous silicon Bragg grating structures. With this technique the grating period can be easily tuned in a wide range. In the porous silicon multilayer formation there is no theoretical limit for the period to be lowered to even below 100 nm. Both p