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Polycrystalline silicon–germanium films on oxide using plasma‐enhanced very‐low‐pressure chemical vapor deposition

✍ Scribed by Tsai, Julie A.; Reif, Rafael


Book ID
111868547
Publisher
American Institute of Physics
Year
1995
Tongue
English
Weight
399 KB
Volume
66
Category
Article
ISSN
0003-6951

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