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Anisotropic carrier transport in preferentially oriented polycrystalline silicon films fabricated by very-high-frequency plasma enhanced chemical vapor deposition using fluorinated source gas

✍ Scribed by K Nakahata; T Kamiya; C.M Fortmann; I Shimizu; H Stuchlı́ková; A Fejfar; J Kočka


Book ID
117150255
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
184 KB
Volume
266-269
Category
Article
ISSN
0022-3093

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