Ion doping system for low temperature po
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Yoshinori Kawasaki
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Article
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2002
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Elsevier Science
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English
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Ion doping technology (IDT) for impurity doping is exactly one of the most important technology in the manufacturing of low temperature poly-silicon (LPS) TFT. Improvement of IDT are carried on according to more large-size glass and the requirement of LPS-TFTรs performance. IDT has become attractive