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P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition

✍ Scribed by J. Puigdollers; J. Cifre; M.C. Polo; J.M. Asensi; J. Bertomeu; J. Andreu; A. Lloret

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 327 KB
Volume: 86
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(94)00420-x

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