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Polycrystalline silicon film deposited by ICP-CVD

✍ Scribed by Byeong Yeon Moon; Jae Hyoung Youn; Sung Hwan Won; Jin Jang

Book ID: 108472266
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 257 KB
Volume: 69
Category: Article
ISSN: 0927-0248
DOI: 10.1016/s0927-0248(00)00387-1

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