๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Characterization of thin polycrystalline silicon films deposited on glass by CVD

โœ Scribed by Benvenuto, A G; Buitrago, R H; Bhaduri, A; Longeaud, C; Schmidt, J A


Book ID
121431853
Publisher
Institute of Physics
Year
2012
Tongue
English
Weight
258 KB
Volume
27
Category
Article
ISSN
0268-1242

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Incubation Effects upon Polycrystalline
โœ S.-Y. Lien; H.-Y. Mao; B.-R. Wu; R.-H. Horng; D.-Sโ€‰. Wuu ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 554 KB

A growth mechanism diagnosis for high-rate, polycrystalline silicon deposition using hot-wire CVD is explored in this article. The effects of various deposition parameters on the Si film growth are investigated by Raman spectroscopy and transmission electron microscopy (TEM) measurements, with speci

Polycrystalline silicon thin films on gl
โœ D. Dimova-Malinovska; O. Angelov; M. Sendova-Vassileva; M. Kamenova; J.-C. Pivin ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 516 KB