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Polycrystalline silicon deposited on glass by subatmospheric-pressure chemical vapour deposition at a high rate

✍ Scribed by Münster, Peter; Sarret, Michel; Mohammed-Brahim, Tayeb; Coulon, Nathalie; Mevellec, Jean-Yves


Book ID
120212485
Publisher
Taylor and Francis Group
Year
2002
Tongue
English
Weight
375 KB
Volume
82
Category
Article
ISSN
1364-2812

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