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Formation of silicon nanoislands on crystalline silicon substrates by thermal annealing of silicon rich oxide deposited by low pressure chemical vapour deposition

✍ Scribed by Yu, Zhenrui; Aceves-Mijares, Mariano; Luna-López, A; Du, Jinhui; Bian, Dongcai


Book ID
126305968
Publisher
Institute of Physics
Year
2006
Tongue
English
Weight
945 KB
Volume
17
Category
Article
ISSN
0957-4484

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A silicon nitride Ðlm was deposited on an Si(100) substrate with a silicon dioxide surface layer from and NH 3 by low-pressure chemical vapour deposition under various conditions. The etching rates of the silicon SiH 2 Cl 2 nitride Ðlms by bu †ered hydroÑuoric acid (BHF) were investigated using Ruth