Silicon wafers were implanted with nitrogen by plasma immersion ion implantation (PIII) to alter the surface hydrophilic properties and wettability. Our X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR) and contact angle measurements indicate that the Si-N bonds
Platelet activation behavior on nitrogen plasma-implanted silicon
โ Scribed by G.J. Wan; N. Huang; P. Yang; Ricky K.Y. Fu; Joan P.Y. Ho; X. Xie; H.F. Zhou; Paul K. Chu
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 771 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0928-4931
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