Barrier behavior hindering Zn++ diffusion from cold remote nitrogen plasma-deposited silicon films

✍ Scribed by C. Jama; K. Asfardjani; O. Dessaux; P. Goudmand

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 162 KB
• Volume: 64
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/(sici)1097-4628(19970425)64:4<699::aid-app9>3.0.co;2-i

✦ Synopsis

Cold remote nitrogen plasma (CRNP) process is used to deposit organosiloxane polymeric films. 1,1,3,3-tetramethyldisiloxane (TMDS) or its mixture with oxygen is used to deposit polymeric layers on a rubber disks at ambient temperature. The deposited films appear to be efficient against chemical agents diffusion from the disks to a distilled water surrounding phase. The barrier efficiency is increased for films deposited from a TMDS/O 2 mixture. The extracted quantity of Zn // after 30 days of immersion in distilled water at ambient temperature is 70% lower in comparison to the uncoated ones. The transfer of Zn // into a liquid phase for coated disks is also discussed.