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Plasma wall interaction for TiNx film deposition in a hollow cathode arc discharge

✍ Scribed by C. Eggs; H. Kersten; H.-E. Wagner; H. Wulff


Book ID
114086120
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
368 KB
Volume
290-291
Category
Article
ISSN
0040-6090

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Plasma Diagnostics in a Hollow Cathode a
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During the deposition of hard titaniumnitrid films the plasma conditions mere investigated with s movable Langmuir-probe in axial and radial directions systematically. The deposition took place in a hollow cathode arc evaporation equipment (HCAE). We measured the electron energy distribution functio