Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX-Deposition
✍ Scribed by A. Lunk; R. Basner
- Publisher
- John Wiley and Sons
- Year
- 1990
- Tongue
- English
- Weight
- 470 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0005-8025
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✦ Synopsis
During the deposition of hard titaniumnitrid films the plasma conditions mere investigated with s movable Langmuir-probe in axial and radial directions systematically. The deposition took place in a hollow cathode arc evaporation equipment (HCAE). We measured the electron energy distribution function (EEDF) or electron temperature, the plasma potential, the concentration of the ions and electrons, the density of the neutral particles and the evaporation characteristics. A twodimensional model was developed to describe the plasma under the conditions of the plasma activated vspour deposition (PAPVD). The model uses the first and second momentums of the Boltzmann equation (hydrodynamical description). Under experimentally realized geometrical conditions the electron temperatures are calculated by this model and are compared with experimental results.
The measured second derivative of the probe characteristic (measured by the sample and hold method) showed, that the EEDF is a Maxwelhan one. The measured electron temperatures are in the range of 2.5-4 eV in accordance with ca~culated values.