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Plasma temperatures during reactive ion etching

✍ Scribed by P.M. Banks


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
310 KB
Volume
11
Category
Article
ISSN
0167-9317

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Reactive ion etching of FePt using induc
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u Γ€ 2u scan for the as-deposited FePt film. The diffraction peaks associated with the formation of L1 0 ordered structure were clearly observed . Furthermore, the magnetic property of the film was investigated employing a superconducting quantum interference device (SQUID) magnetometer with the magn