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Plasma-enhanced evaporation of SiO2 films for MBE-grown MOS devices

✍ Scribed by Alexandra Neubecker; Peter Bieringer; Walter Hansch; Ignaz Eisele

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 375 KB
Volume: 157
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(95)00386-x

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