Optimization of a-Si1−xCx: H films prepared by ultrahigh vacuum plasma enhanced chemical vapour deposition for electroluminescent devices

✍ Scribed by F. Demichelis; G. Crovini; C.F. Pirri; E. Tresso; G. Amato; U. Coscia; G. Ambrosone; P. Rava

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 376 KB
• Volume: 241
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(94)90440-5