Plasma enhanced deposition of ‘silicon nitride’ for use as an encapsulant for silicon ion-implanted gallium arsenide

✍ Scribed by DC Bartle; DC Andrews; JD Grange; PG Harris; AD Trigg; DK Wickenden

• Publisher: Elsevier Science
• Year: 1984
• Tongue: English
• Weight: 422 KB
• Volume: 34
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(84)90148-9