✦ LIBER ✦
7217. Plasma deposited silicon nitride encapsulant for rapid thermal annealing of Si-implanted GaAs: S Lee and A Gopinath,J Vac Sci Technol, A8, 1990, 402–406
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 144 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
No coin nor oath required. For personal study only.