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Plasma-Enhanced CVD of Fluorocarbon Thin Films via CF3H/H2 Chemistries

✍ Scribed by J. J. Senkevich; M. J. Tutor; D. W. Sherrer II

Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
270 KB
Volume
6
Category
Article
ISSN
0948-1907

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