✦ LIBER ✦

Plasma-enhanced chemical vapour deposition of amorphous GexSe1−x films

✍ Scribed by E. Sleeckx; P. Nagels; R. Callaerts; M. Van Roy

Book ID: 115989345
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 298 KB
Volume: 164-166
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(93)91214-n

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

On the optical constants of amorphous Ge

On the optical constants of amorphous GexSe1−x thin films of non-uniform thickness prepared by plasma-enhanced chemical vapour deposition

✍ E Márquez; P Nagels; J.M González-Leal; A.M Bernal-Oliva; E Sleeckx; R Callaerts 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 425 KB

Amorphous hydrogenated carbon nitride fi

Amorphous hydrogenated carbon nitride films obtained by plasma-enhanced chemical vapour deposition

✍ F.L. Freire Jr.; G. Mariotto; C.A. Achete; D.F. Franceschini 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 394 KB

Deposition of silver films by plasma-enh

Deposition of silver films by plasma-enhanced chemical vapour deposition

✍ C. Oehr; H. Suhr 📂 Article 📅 1989 🏛 Springer 🌐 English ⚖ 867 KB

Deposition of silicon carbide films by p

Deposition of silicon carbide films by plasma enhanced chemical vapour deposition

✍ J Ramirez; H Suhr; L Szepes; L Zanathy; A Nagy 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 692 KB

Preparation of hydrogenated amorphous si

Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition

✍ J Huran; J Šafránková; A.P. Kobzev 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 252 KB

Thin silicon carbide (SiCI films were prepared by plasma enhanced chemical vapour deposition PECVDI. The structural properties of Sic films were investigated by IR, RBS, and ERD measurement techniques. The results showed that the films contain the typical features found in hydrogenated amorphous Sic

Properties of hydrogenated amorphous/nan

Properties of hydrogenated amorphous/nanocrystalline carbon films prepared by plasma enhanced chemical vapour deposition

✍ Huran, J; Zat'ko, B; Boháček, P; Kobzev, A P; Vincze, A; Malinovský, E; Valovič, 📂 Article 📅 2010 🏛 IOP Publishing ⚖ 386 KB