Plasma enhanced chemical vapor deposition process optimization for thin film silicon tandem junction solar cells

✍ Scribed by Rohde, Martin; Zelt, Matthias; Gabriel, Onno; Neubert, Sebastian; Kirner, Simon; Severin, Daniel; Stolley, Tobias; Rau, Björn; Stannowski, Bernd; Schlatmann, Rutger

• Book ID: 121781344
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 1000 KB
• Volume: 558
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2014.03.008