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Plasma deposition of n-SiOx nanocrystalline thin film for enhancing the performance of silicon thin film solar cells

โœ Scribed by X.D. Zhang; Q. Yue; X.X. Zheng; X.H. Geng; Y. Zhao


Book ID
113937120
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
735 KB
Volume
520
Category
Article
ISSN
0040-6090

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The authors report the photoluminescence (PL) property of nanocrystalline silicon (nc-Si) enhanced by oxygen plasma oxidation technology. The oxidized nanocrystalline silicon thin films were investigated by PL, transmission electron microscope (TEM), micro-Raman scattering and X-ray diffraction (XRD