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Plasma deposition of low-dielectric-constant fluorinated amorphous carbon

✍ Scribed by Endo, Kazuhiko; Shinoda, Keisuke; Tatsumi, Toru

Book ID: 120543743
Publisher: American Institute of Physics
Year: 1999
Tongue: English
Weight: 455 KB
Volume: 86
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.371119

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