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Plasma-based ion implantation and deposition: a review of physics, technology, and applications

✍ Scribed by Pelletier, J.; Anders, A.

Book ID
120071273
Publisher
IEEE
Year
2005
Tongue
English
Weight
569 KB
Volume
33
Category
Article
ISSN
0093-3813

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πŸ“œ SIMILAR VOLUMES

Physics of plasma-based ion implantation
Physics of plasma-based ion implantation & deposition (PBIID) and high power impulse magnetron sputtering (HIPIMS): A comparison
✍ Anders, AndrΓ© πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 431 KB

## Abstract The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma‐Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma‐sheath sys

Comparison of ZrN and TiN formed by plas
Comparison of ZrN and TiN formed by plasma based ion implantation & deposition
✍ S. Heinrich; S. Schirmer; D. Hirsch; J.W. Gerlach; D. Manova; W. Assmann; S. MΓ€n πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 989 KB

ZrN and TiN films have been deposited on Si substrates without additional heating using plasma based ion implantation & deposition (PBII&D) with pulse voltage from 0 to 5 kV. High quality columnar films have been obtained in both systems with a slight nitrogen deficiency. For ZrN, a marked reduction