Picosecond optical measurements of the properties of heavily carbon-implanted silicon
β Scribed by Steven C. Moss; John F. Knudsen; John E. Wessel
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 312 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0921-5107
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β¦ Synopsis
We have used picosecond transient photoreflectance techniques to measure the near-surface characteristics of unimplanted silicon and of silicon heavily implanted with carbon. These laser-based diagnostic techniques are non-destructive and allow measurement of the modification of near-surface properties sensitive to both photocarrier and photothermal phenomena. Photothermal phenomena dominate these results and yield important information concerning the extent of implant-induced materials modification.
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The Jormation of amorphous zones in thin heteroepitaxial layers" of silicon has been investigated by optical transmission spectroscopy' with ion species, dose, intensity and irradiation temperature as the main parameters. The dependence of the recrystallization of the irradiated layers on annealing