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Photo-Electrochemical Gate Recess Etching for the Fabrication of AlGaN/GaN Heterostructure Field Effect Transistor

✍ Scribed by Lee, Jae-Seung; Kim, Jong-Wook; Jung, Doo-Chan; Kim, Chang-Seok; Lee, Won-Sang; Lee, Jae-Hak; Shin, Jin-Ho; Shin, Moo-Whan; Oh, Jae-Eung; Lee, Jung-Hee

Book ID: 125431677
Publisher: Institute of Pure and Applied Physics
Year: 2001
Tongue: English
Weight: 540 KB
Volume: 40
Category: Article
ISSN: 0021-4922
DOI: 10.1143/jjap.40.l198

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