Phase formation in Ti after high fluence
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D. Manova; J.W. Gerlach; H. Neumann; W. Assmann; S. Mändl
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Article
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2006
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Elsevier Science
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English
⚖ 377 KB
Nitrogen ion implantation in titanium using plasma immersion ion implantation (PIII) is investigated at a pulse voltage of 15 keV and elevated temperatures between 300 and 750 °C. Starting the implantation at room temperature leads to the parallel formation of TiN and Ti 2 N, as observed by X-ray di