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Pd nanoclusters grown by plasma sputtering deposition on amorphous substrates

โœ Scribed by A.-L. Thomann; J.P. Rozenbaum; P. Brault; C. Andreazza-Vignolle; P. Andreazza

Book ID
104309080
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
696 KB
Volume
158
Category
Article
ISSN
0169-4332

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โœ M. Akani; J.E. Bouree; R. Suryanarayanan; M. Rodot; G. Brun; M. Caymax ๐Ÿ“‚ Article ๐Ÿ“… 1987 ๐Ÿ› Elsevier Science โš– 277 KB

The plasma spray technique was used to obtain p-type polycrystalline silicon deposits 200 #m -2 mm thick and of area 1 cm 2. Silicon layers 50 #m thick were grown on these deposits by chemical vapour deposition. The electronic diffusion length of plasma-sprayed silicon was found to be in the range 9