Structural characterization of thick, high-quality epitaxial Ge on Si substrates grown by low-energy plasma-enhanced chemical vapor deposition

✍ Scribed by Shawn G. Thomas; Sushil Bharatan; Robert E. Jones; Rainer Thoma; Thomas Zirkle; N. V. Edwards; Ran Liu; Xiang Dong Wang; Qianghua Xie; Carsten Rosenblad; Juergen Ramm; Giovanni Isella; Hans Von Känel

• Book ID: 107453092
• Publisher: Springer US
• Year: 2003
• Tongue: English
• Weight: 220 KB
• Volume: 32
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-003-0233-9