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PC system for improving the control of reactive gas dosage in sputtering processes for film deposition

✍ Scribed by G.N. Pedersen; H. Jensen; G. S∅rensen


Book ID
107930247
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
313 KB
Volume
59
Category
Article
ISSN
0257-8972

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