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A single quality factor for the deposition process of reactively sputtered thin a-C:H:N films

✍ Scribed by G. Messina; S. Santangelo; A. Tagliaferro; A. Tucciarone

Book ID
117146317
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
151 KB
Volume
318
Category
Article
ISSN
0022-3093

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## Abstract The temperature sensitive nature of the substrates used in the flexible displays market necessitates a low temperature deposition technique for processing them. ZnS:Mn exhibiting high intensity photoluminescence (PL) and good crystallinity has been deposited onto Si wafers, glass micros