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Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride

✍ Scribed by Jan Pieter Dekker; Paul J. Van der Put; Hubert J. Veringa; Joop Schoonman

Book ID
110089941
Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
317 KB
Volume
80
Category
Article
ISSN
0002-7820

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ChemInform Abstract: Particle-Precipitat
ChemInform Abstract: Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride.
✍ J. P. DEKKER; P. J. VAN DER PUT; H. J. VERINGA; J. SCHOONMAN πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons βš– 25 KB πŸ‘ 2 views

Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride. -The title process (PP-CVD) is studied for the deposition of TiN. It consists of formation of an aerosol, particle deposition driven by thermophoresis, and interconnection or sintering of the particles. PP-CVD enables the f