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ChemInform Abstract: Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride.

✍ Scribed by J. P. DEKKER; P. J. VAN DER PUT; H. J. VERINGA; J. SCHOONMAN

Publisher: John Wiley and Sons
Year: 2010
Weight: 25 KB
Volume: 28
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199725249

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✦ Synopsis

Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride.

-The title process (PP-CVD) is studied for the deposition of TiN. It consists of formation of an aerosol, particle deposition driven by thermophoresis, and interconnection or sintering of the particles. PP-CVD enables the formation of dense to porous layers depending on the experimental conditions. -(DEKKER,

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