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ChemInform Abstract: Barrier Properties of Titanium Nitride Films Grown by Low Temperature Chemical Vapor Deposition from Titanium Tetraiodide.

✍ Scribed by C. FALTERMEIER; C. GOLDBERG; M. JONES; A. UPHAM; D. MANGER; G. PETERSON; J. LAU; A. E. KALOYEROS; B. ARKLES; A. PARANJPE

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