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ChemInform Abstract: The Chemical Vapor Deposition of Metal Nitride Films Using Modern Metalorganic Precursors

✍ Scribed by Charles H. Winter


Publisher
John Wiley and Sons
Year
2000
Weight
24 KB
Volume
31
Category
Article
ISSN
0931-7597

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✦ Synopsis


Abstract

ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a β€œFull Text” option. The original article is trackable via the β€œReferences” option.


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ChemInform Abstract: Metalorganic Chemic
✍ S. L. STOLL; A. R. BARRON πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons βš– 33 KB πŸ‘ 1 views

InSe films are grown at 230-420 β€’ C by low-pressure MOCVD from [(tBu) 2 In(Β΅-SetBu)] 2 and [(Me 2 EtC)In(Β΅ 3 -Se)] 4 . Energy-dispersive X-ray analysis shows that films grown from the first precursor are In rich, while those from the second one are stoichiometric InSe. At temperatures Β‘ 330 β€’ C ball