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Crystal growth of titanium nitride by chemical vapor deposition

โœ Scribed by Akio Kato; Nobuyuki Tamari


Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
612 KB
Volume
29
Category
Article
ISSN
0022-0248

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Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride. -The title process (PP-CVD) is studied for the deposition of TiN. It consists of formation of an aerosol, particle deposition driven by thermophoresis, and interconnection or sintering of the particles. PP-CVD enables the f