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Chemical vapor deposition of titanium–silicon–nitride films

✍ Scribed by Smith, Paul Martin; Custer, J. S.

Book ID: 121658940
Publisher: American Institute of Physics
Year: 1997
Tongue: English
Weight: 490 KB
Volume: 70
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.119108

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