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Chemical vapor deposition of titanium nitride at low temperatures

โœ Scribed by S.R. Kurtz; R.G. Gordon


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
760 KB
Volume
140
Category
Article
ISSN
0040-6090

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Particle-Precipitation-Aided Chemical Vapor Deposition of Titanium Nitride. -The title process (PP-CVD) is studied for the deposition of TiN. It consists of formation of an aerosol, particle deposition driven by thermophoresis, and interconnection or sintering of the particles. PP-CVD enables the f