๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Partial diagnostic data to plasma etch modeling using neural network

โœ Scribed by Byungwhan Kim; Sebum Kim


Book ID
108207370
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
303 KB
Volume
75
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Prediction of plasma etch process by usi
โœ Byungwhan Kim; Minji Kwon ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 395 KB

Optical emission spectroscopy (OES) data were used to construct neural network models of plasma etch process. According to a statistical experiment, actinomeric OES data were collected from the etching of oxide thin films in a CHF 3 -CF 4 magnetically enhanced reactive ion etching system. The etch r