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Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment

✍ Scribed by Byungwhan Kim; Jeong Kim; Seongjin Choi

Book ID: 108128264
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 367 KB
Volume: 36
Category: Article
ISSN: 0957-4174
DOI: 10.1016/j.eswa.2009.03.004

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