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Advantages of plasma etch modeling using neural networks over statistical techniques

✍ Scribed by Himmel, C.D.; May, G.S.

Book ID: 126788377
Publisher: IEEE
Year: 1993
Tongue: English
Weight: 893 KB
Volume: 6
Category: Article
ISSN: 0894-6507
DOI: 10.1109/66.216928

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